The initial cost of many small and medium-sized electronics factories is controllable, and the general-purpose simple pure water equipment is directly applied. The pre-filtration level is insufficient and the single-stage RO desalination margin is not enough. Pits are directly buried in the back-end ultrapure water system: colloids, heavy metals, and small molecular organic matter remaining in the water continue to impact the EDI and polishing resin, which eventually leads to ultra-pure water resistivity transitions, TOC exceeds the standard, and nanoscale watermarks and microparticles are left on the surface after the chip is cleaned, and the yield is directly reduced by several percentage points.Ordinary water purification equipment simply cannot withstand the semiconductor-level pre-water supply requirements. Only customized RO reverse osmosis equipment can build the first precision line of defense for ultrapure water systems.
RO reverse osmosis equipment
Xi'an DIEN Water treatment has deeply cultivated the Northwest electronic semiconductor water scene, relying on exclusive customized RO reverse osmosis equipment to solve the pain points of unstable pre-water supply for a number of chip packaging and precision cleaning companies.A chip packaging factory in Xi'an High-tech zone has stepped on the pit of old equipment: the equipment that has been in service for 5 years has only a two-stage simple filter tank in the front, and the iron ions and colloids in the water directly contaminate the membrane surface. The RO membrane must be chemically cleaned once a month. The desalination rate is stuck at 96% all year round, and the back-end ultra-pure water resistivity frequently falls below 15MW·cm. After the chip is cleaned, there are residual impurities in the micro-circuit, and the defect rate remains high, and it is completely unable to keep up with the 24-hour continuous production rhythm.
DIEN's technical team went to the door to sample and test step by step, and customized the pre-upgrade plan in a targeted manner: three-stage gradient pretreatment was added to intercept sediment, colloids and heavy metals, and replaced with high-pollution-resistant two-stage RO reverse osmosis equipment, with intelligent differential pressure linkage automatic backwash program, adapted to the continuous production conditions of the factory.After commissioning and commissioning, the desalination rate of the two-stage RO system is stable at more than 99.2%, and the pre-production water SDI is ≤1.The RO membrane cleaning cycle is extended to 12 months, the back-end ultra-pure water resistivity is stable at 18.2MW·cm throughout the process, there is no impurity residue after the chip is cleaned, the product defect rate is directly pressed to within 0.3%, and the annual consumables operation and maintenance costs are cut by nearly 40%.
As a local source manufacturer in Xi'an, DIEN Water treatment can customize a full range of equipment solutions for chip cleaning conditions in electronic factories, from pretreatment, two-stage reverse osmosis to the full-process adaptation of the back-end ultrapure water unit, free door-to-door survey of water samples, and provide full-cycle localized operation and maintenance services to help electronic companies completely stabilize the accuracy of production water.
